This service is suitable for fabrication of patterned ferromagnetic thin films used as micromagnets on e.g. spin qubit chips. IPMS has developed a streamlined process sequence for Co deposition (MOCVD, PVD or ECD) with high uniformity and subsequent dry etch based patterning. Optional modules for morphology modification (e.g. heat treatments) and magnetic characterization are qualified as well. Wafer size: 200mm, 300mm, Standard chip sizes: mm – cm size (not restricted due to maskless lithography), Magnet critical dimension: ≥ 150nm, Ferromagnet thickness range: