The lithography demands for the manufacturing of semiconductor quantum devices are quite stringent, sometimes beyond what it is available at the present. We offer the possibility to deliver test structures designed specifically to develop and/or validate new advances in lithography for qubit manufacturing, primarily aimed at process equipment companies. The pilot line for fabrication of semiconductor quantum devices can deliver test structures designed on purpose to characterize specific lithography methods, for example to improve overlay alignment or to characterize repeatability. Characterization facilities at the pilot line can be used to benchmark the results.